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Volumn 42, Issue 1, 2002, Pages 19-34
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Importance of grid refinement in numerical modeling of chemical vapor deposition processes
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Author keywords
[No Author keywords available]
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Indexed keywords
APPROXIMATION THEORY;
ATMOSPHERIC PRESSURE;
BOUNDARY LAYERS;
HYDRODYNAMICS;
SILANES;
SUBSTRATES;
SURFACE REACTIONS;
GAS-PHASE REACTIONS;
CHEMICAL VAPOR DEPOSITION;
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EID: 0036642052
PISSN: 10407790
EISSN: None
Source Type: Journal
DOI: 10.1080/10407790190053815 Document Type: Article |
Times cited : (3)
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References (21)
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