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Volumn 42, Issue 1, 2002, Pages 19-34

Importance of grid refinement in numerical modeling of chemical vapor deposition processes

Author keywords

[No Author keywords available]

Indexed keywords

APPROXIMATION THEORY; ATMOSPHERIC PRESSURE; BOUNDARY LAYERS; HYDRODYNAMICS; SILANES; SUBSTRATES; SURFACE REACTIONS;

EID: 0036642052     PISSN: 10407790     EISSN: None     Source Type: Journal    
DOI: 10.1080/10407790190053815     Document Type: Article
Times cited : (3)

References (21)
  • 14
    • 0033752548 scopus 로고    scopus 로고
    • Computational modeling of transport phenomena and detailed chemistry in chemical vapor deposition - A benchmark solution
    • (2000) Thin Solid Films , vol.365 , pp. 294-306
    • Kleijn, C.R.1
  • 17
    • 0026186906 scopus 로고
    • A mathematical model for the hydrodynamics and gas phase reactions in silicon LPCVD in a single wafer reactor
    • (1991) J. Electrochem. Soc. , vol.138 , pp. 2190-2200
    • Kleijn, C.R.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.