Physical-chemical evolution of Hf-aluminates upon thermal treatments

Materials Research Society Symposium - Proceedings

Volumn 765, Issue , 2003, Pages 65-70

  Crivelli, B ^a   Alessandri, M ^a   Alberici, S ^a   Brazzelli, D ^a   Elbaz, A C ^a   Frabboni, S ^b   Ghidini, G ^a   Maes, J W ^c   Ottaviani, G ^b   Pavia, G ^a   Wiemer, C ^d  

^a STMICROELECTRONICS   (Italy)

^b UNIVERSITY OF MODENA AND REGGIO EMILIA   (Italy)

^c ASM International   (Belgium)

^d LABORATORIO MDM   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; COMPOSITION; CRYSTALLIZATION; DIFFUSION; ELECTRIC PROPERTIES; HEAT TREATMENT; INTERFACES (MATERIALS); PHASE DIAGRAMS; THERMODYNAMIC STABILITY; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

HAFNIUM ALUMINATES; PHYSICAL-CHEMICAL EVOLUTION; POST DEPOSITION ANNEALING;

HAFNIUM COMPOUNDS;

EID: 0242661452     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-765-d2.10     Document Type: Conference Paper

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