Preparation and characterization of the nanoporous ultrathin multilayer films based on molybdenum polyoxometalate (Mo38)n

Journal of Solid State Chemistry

Volumn 176, Issue 1, 2003, Pages 13-17

  Wang, L ^a   Jiang, M ^a   Wang, E B ^a   Duan, L Y ^a   Hao, N ^a   Lan, Y ^a   Xu, L ^a,b   Li, Z ^b  

^a NORTHEAST NORMAL UNIVERSITY   (China)

^b CHANGCHUN INSTITUTE OF APPLIED CHEMISTRY   (China)

Author keywords

Electrochemical behavior; Layer by layer; Polyelectrolyte; Polyoxometalates; Ultrathin multilayer film

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTROCHEMISTRY; FILM GROWTH; MOLYBDENUM COMPOUNDS; MULTILAYERS; SELF ASSEMBLY; X RAY PHOTOELECTRON SPECTROSCOPY;

ROOM TEMPERATURE;

ULTRATHIN FILMS;

ALLYLAMINE; MOLYBDENUM COMPLEX; MOLYBDENUM POLYOXOMETALATE; UNCLASSIFIED DRUG;

ADSORPTION; ARTICLE; ATOMIC FORCE MICROSCOPY; CLUSTER ANALYSIS; ELECTROCHEMISTRY; FILM; ROOM TEMPERATURE; ULTRAVIOLET RADIATION; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0242541098     PISSN: 00224596     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-4596(03)00277-9     Document Type: Article

References (22)

1. Krass H., Papastavrou G., Kurth D.G. Chem. Mater. 15:2003;196.
2. Ulman A. Introduction to Thin Films. From Langmuir-Blodgett to Self-assembly:1991;Academic Press, Boston.
3. Decher G. Science. 277:1997;1232.
4. Schmitt J., Decher G., Dressick W.J., Brandow S.L., Geer R.E., Shashidhar R., Calvert J.M. Adv. Mater. 9:1997;61.
5. Dutta A.K., Ho T., Zhang L., Stroeve P. Chem. Mater. 12:2000;1042.
6. Clark S.L., Handy E.S., Rubner M.F., Hammond P.H. Adv. Mater. 11:1999;103.
7. Zhang X., Shen J.C. Adv. Mater. 11:1999;1139.
8. He J.A., Valluzzu R., Yang K., Dolukhanyan T., Sung C.M., Kumar J., Tripathy S.K., Samuelson L.A., Balogh L., Tomalia D.A. Chem. Mater. 11:1999;3268.
9. Pastoriza-Santos I., Koktysh D.S., Mamedov A.A., Giersig M., Kotov N.A., Liz-Marzan L.M. Langmuir. 16:2000;2731.
10. Wang L., Liu Z., Zhou Y., Wang E.B. J. Chin. Univ. 18(6):1997;846 Xiuli Wang, Enbo Wang Yanglan, Changwen Hu, Electroanalysis 14 (2002) 1116. Xiuli Wang, Zhenhui Kang, Enbo Wang, Changwen Hu, J. Electroanal. Chem. V523 (1-2) (2002) 142. Xiuli Wang, Enbo Wang, Changwen Hu, Chem. Lett. (2001) 1030. Zhang H.Y., Xu L., Wang E.B., Jiang M., Wu A.G., Li Z. Mater. Lett. 57:2003;1417.
11. Wang L., Liu Z., Zhou Y., Wang E.B. J. Chin. Univ. 18(6):1997;846 Xiuli Wang, Enbo Wang Yanglan, Changwen Hu, Electroanalysis 14 (2002) 1116. Xiuli Wang, Zhenhui Kang, Enbo Wang, Changwen Hu, J. Electroanal. Chem. V523 (1-2) (2002) 142. Xiuli Wang, Enbo Wang, Changwen Hu, Chem. Lett. (2001) 1030. Zhang H.Y., Xu L., Wang E.B., Jiang M., Wu A.G., Li Z. Mater. Lett. 57:2003;1417.
12. Hu C., Zhang Y., Xu L. Appl. Catal. A. 177:1999;237.
13. Liu G., Wei Y., Yu Q., Liu Q., Zhang S. Inorg. Chem. Commun. 2:1999;434.
14. Müller A., Krickemeyer E., Bögge H., Schmidtmann M., Peters F., Menke C., Meyer J. Angew. Chem. 109:1997;500.
15. Müller A., Krickemeyer E., Bögge H., Schmidtmann M., Peters F., Menke C., Meyer J. Angew. Chem. Int. Ed. Engl. 36:1997;484.
16. Kurth D.G., Lehmann P., Volkmer D., Müller A., Schwahn D. J. Chem. Soc., Dalton Trans. 21:2000;3989.
17. Ichinose I., Tagawa H., Mizuki H., Lvov Y., Kunitake T. Langmuir. 14:1998;3462.
18. Caruso F., Kurth D.G., Volkmer D., Koop M.J., Müller A. Langmuir. 14:1998;187.
19. Kurth D.G., Volkmer D., Ruttorf M., Richter B., Müller A. Chem. Mater. 12:2000;2829.
20. S. Zhang, D. Qing, M. Shao, Y. Tang, J. Chem. Soc., Chem. Commun. (1986) 835.
21. Xu L., Zhang H., Wang E.B., Kurth D.G., Li Z. J. Mater. Chem. 12:2002;654.
22. Liu S., Kurth D.G., Bredenkotter B., Volkmer D. J. Am. Chem. Soc. 124(41):2002;12279.