Aluminum oxidation by a remote electron cyclotron resonance plasma in magnetic tunnel junctions

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 5, 2003, Pages 2120-2122

  Thomas, A ^a   Bruckl H ^a   Sacher, M D ^a   Schmalhorst, J ^a   Reiss, G ^a  

^a BIELEFELD UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON CYCLOTRON RESONANCE; FILMS; ION BOMBARDMENT; MAGNETIC DEVICES; MAGNETORESISTANCE; OXIDATION; PLASMA SOURCES; THERMAL EFFECTS; TUNNEL JUNCTIONS;

ALUMINUM BARIERS; ALUMINUM OXIDATION; CURRENT BIAS VOLTAGE; MAGNETIC TUNNEL JUNCTIONS; REMOTE ELECTRON CYCLOTRON RESONANCE PLASMA;

ALUMINUM;

EID: 0242509081     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1609480     Document Type: Article

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