Advanced DUV photolithography in a pilot line environment

IBM Journal of Research and Development

Volumn 41, Issue 1-2, 1997, Pages 21-36

  Ausschnitt, C P ^a   Thomas, A C ^a   Wiltshire, T J ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

LOGIC DEVICES; RANDOM ACCESS STORAGE; SEMICONDUCTOR DEVICE MANUFACTURE; ULTRAVIOLET RADIATION;

DEEP ULTRAVIOLET (DUV) LITHOGRAPHY; DYNAMIC RANDOM ACCESS MEMORIES (DRAM);

PHOTOLITHOGRAPHY;

EID: 0030653344     PISSN: 00188646     EISSN: None     Source Type: Journal    
DOI: 10.1147/rd.411.0021     Document Type: Article

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