SCOPUS 정보 검색 플랫폼

Volumn 18, Issue 1, 2003, Pages 16-31

The benefits of dynamic reaction cell ICP-MS technology to determine ultratrace metal contamination levels in high-purity phosphoric and sulfuric acid

(3) Kawabata, Katsu a Kishi, Yoko a Thomas, Robert b

a MDS SCIEX (Canada)

b NONE

Author keywords

[No Author keywords available]

Indexed keywords

DYNAMIC REACTION CELLS (DRC); GAS FLOW; QUADROUPOLE; SEMICONDUCTOR INDUSTRY;

AMMONIA; CHEMICAL CLEANING; ELECTRIC FIELDS; FILTRATION; IONIZATION; MASS SPECTROMETRY; OPTIMIZATION; PHOSPHORIC ACID; SULFURIC ACID; TRACE ELEMENTS;

INDUCTIVELY COUPLED PLASMA;

EID: 0242327620 PISSN: 08876703 EISSN: None Source Type: Journal
DOI: None Document Type: Review

Times cited : (14)

References (13)

1
- 0004245602
- "International Technology Roadmap for Semiconductors" (ITRS), http://public.itrs.net (2001).
- (2001) "International Technology Roadmap for Semiconductors" (ITRS)

2
- 84876490372
- Semi-conductor Equipment and Materials International, San Jose, CA
- Book of SEMI Standards (BOSS) (Semi-conductor Equipment and Materials International, San Jose, CA (2001).
- (2001) Book of SEMI Standards (BOSS)

3
- 85030799096
- SEMI C36-0301, Semiconductor Equipment and Materials International, San Jose, CA
- SEMI C36-0301, "Specifications for Grade 3 Phosphoric Acid" (Semiconductor Equipment and Materials International, San Jose, CA (2001).
- (2001) Specifications for Grade 3 Phosphoric Acid

4
- 0031235336
- September
- R.A. Aleksejczyk and D. Gibilisco, Micro, September, 39-42 (1997).
- (1997) Micro , pp. 39-42
- Aleksejczyk, R.A.¹ Gibilisco, D.²

5
- 84876459420
- SEMI C44-0301, Semiconductor Equipment and Materials International, San Jose, CA
- SEMI C44-0301, "Specifications and Guidelines for Sulfuric Acid" (Semiconductor Equipment and Materials International, San Jose, CA (2001).
- (2001) Specifications and Guidelines for Sulfuric Acid

6
- 4243456085
- S.J. Jiang, R.S. Houk, and M.A. Stevens, Anal. Chem. 60, 217 (1988).
- (1988) Anal. Chem. , vol.60 , pp. 217
- Jiang, S.J.¹ Houk, R.S.² Stevens, M.A.³

7
- 0002576398
- S.D. Tanner, M. Paul, S.A. Beres, and E.R. Denoyer, Atom. Spectrosc. 16(1) 16-18 (1995).
- (1995) Atom. Spectrosc. , vol.16 , Issue.1 , pp. 16-18
- Tanner, S.D.¹ Paul, M.² Beres, S.A.³ Denoyer, E.R.⁴

8
- 0039850607
- Plasma source mass spectrometry: Developments and applications
- Durham, UK, eds. S.D. Tanner and G. Holland (Royal Society of Chemistry, Cambridge, UK)
- P. Turner, T. Merren, J. Speakman, and C. Haines, "Plasma Source Mass Spectrometry: Developments and Applications," in Proceedings from the Fifth International Conference on Plasma Source Mass Spectrometry, Durham, UK, eds. S.D. Tanner and G. Holland (Royal Society of Chemistry, Cambridge, UK, 1996).
- (1996) Proceedings from the Fifth International Conference on Plasma Source Mass Spectrometry
- Turner, P.¹ Merren, T.² Speakman, J.³ Haines, C.⁴

9
- 0000621636
- I. Feldman, N. Jakubowski, C. Thomas, and D. Stuewer, Fresnius J. Anal. Chem. 365, 422-428 (1999).
- (1999) Fresnius J. Anal. Chem. , vol.365 , pp. 422-428
- Feldman, I.¹ Jakubowski, N.² Thomas, C.³ Stuewer, D.⁴

10
- 0002701448
- S.D. Tanner and V.I. Baranov, Atom. Spectrosc. 20(2) 45-52 (1999).
- (1999) Atom. Spectrosc. , vol.20 , Issue.2 , pp. 45-52
- Tanner, S.D.¹ Baranov, V.I.²

11
- 84876503115
- Covered by United States Patent Number 6140638
- Covered by United States Patent Number 6140638.

12
- 0002429319
- D.S. Bollinger and A.J. Schleisman, Atom. Spectrosc. 20(2) 60-63 (1999).
- (1999) Atom. Spectrosc. , vol.20 , Issue.2 , pp. 60-63
- Bollinger, D.S.¹ Schleisman, A.J.²

13
- 0038598633
- January
- J.M. Collard, K. Kawabata, Y. Kishi, and R. Thomas, Micro, January, 2002, 39-46.
- (2002) Micro , pp. 39-46
- Collard, J.M.¹ Kawabata, K.² Kishi, Y.³ Thomas, R.⁴

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.