Single Asperity Chemical Mechanical Wear Studied by Atomic Force Microscopy

Materials Research Society Symposium - Proceedings

Volumn 767, Issue , 2003, Pages 79-85

  Stevens, Forrest ^a   Langford, Steve ^a   Dickinson, J Thomas ^a  

^a WASHINGTON STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; GLASS; SILICON NITRIDE; SUBSTRATES;

CHEMICAL MECHANICAL WEAR;

WEAR OF MATERIALS;

EID: 0242322632     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-767-f2.1     Document Type: Conference Paper

References (6)

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2. 2 in KOH Solution," J. Electrochem. Soc. 147 (6), 2328-2331 (2000).
3. W. Maw, F. Stevens, S. C. Langford, and J. T. Dickinson, "Single asperity tribochemical wear of silicon nitride studied by atomic force microscopy," J. Appl. Phys. 92 (2), 5103-5109 (2002).
4. 4 sliding in water," Wear 250, 246-255 (2001).
5. S. Jahanmir and T. E. Fischer, "Friction and wear of silicon nitride lubricated by humid air, water, hexadecane and hexadecane + 0.5 percent stearic acid," STLE Transactions 31 (1), 32-43 (1988).
6. V. A. Muratov, T. Luangvaranunt, and T. E. Fischer, "The Tribochemisty of Silicon Nitride: Effects of Friction, Temperature and Sliding Velocity," Tribology International 31 (10), 601-611 (1998).