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Volumn 83, Issue 15, 2003, Pages 3207-3209

Photoresist-free printing of amorphous silicon thin-film transistors

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; DIELECTRIC MATERIALS; ELECTROSTATIC PRINTING; ETCHING; MASKS; PHOTORESISTS; POLYIMIDES; TRANSPARENCY;

EID: 0242304430     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1618364     Document Type: Article
Times cited : (9)

References (21)
  • 17
    • 0242341318 scopus 로고    scopus 로고
    • All chromium films were etched with CR-7 from Cyantek Corp., Freemont, CA.
    • All chromium films were etched with CR-7 from Cyantek Corp., Freemont, CA.
  • 18
    • 0242341316 scopus 로고    scopus 로고
    • note
    • 3.
  • 19
    • 0242341317 scopus 로고    scopus 로고
    • note
    • 2.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.