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Volumn 31, Issue 5 II, 2003, Pages 1010-1015

Millimeter-wave materials processing in Japan by high-power gyrotron

Author keywords

Ceramics; Gyrotron; Materials processing; Millimeter wave

Indexed keywords

ALUMINUM NITRIDE; CERAMIC MATERIALS; GRAIN BOUNDARIES; GRAIN SIZE AND SHAPE; MILLIMETER WAVES; SILICON NITRIDE; SINTERING; SURFACE TREATMENT; THERMAL CONDUCTIVITY; THERMAL EFFECTS; THIN FILMS; YTTERBIUM COMPOUNDS;

EID: 0242273383     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2003.818401     Document Type: Article
Times cited : (22)

References (13)
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  • 4
    • 22244433747 scopus 로고
    • Possibility of plastic deformation of an ionic crystal due to the nonthermal influence of a high frequency electric field
    • K. I. Rybakov and V. E. Semenov, "Possibility of plastic deformation of an ionic crystal due to the nonthermal influence of a high frequency electric field," Phys. Rev. B, Condens. Matter, vol. 49, no. 1, pp. 64-68, 1994.
    • (1994) Phys. Rev. B, Condens. Matter , vol.49 , Issue.1 , pp. 64-68
    • Rybakov, K.I.1    Semenov, V.E.2
  • 5
    • 0026155003 scopus 로고
    • Focusing of high power millimeter-wave radition by a quasioptical antenna system
    • S. Miyake, O. Wada, M. Nakajima, T. Idehara, and G. Brand, "Focusing of high power millimeter-wave radition by a quasioptical antenna system," Int. J. Electron., vol. 70, no. 5, pp. 979-988, 1991.
    • (1991) Int. J. Electron. , vol.70 , Issue.5 , pp. 979-988
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  • 12
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    • Preparation of strontium titanate thin films by mirror-confinement-type electron cyclotron resonance plasma sputtering
    • S. Baba, K. Numata, H. Saito, M. Kumagai, T. Ueno, B. Kyoh, and S. Miyake, "Preparation of strontium titanate thin films by mirror-confinement-type electron cyclotron resonance plasma sputtering," Thin Solid Films, vol. 390, pp. 70-75, 2001.
    • (2001) Thin Solid Films , vol.390 , pp. 70-75
    • Baba, S.1    Numata, K.2    Saito, H.3    Kumagai, M.4    Ueno, T.5    Kyoh, B.6    Miyake, S.7
  • 13
    • 0001224049 scopus 로고    scopus 로고
    • 3 thin films prepared by mirror-confinement-type ECR plasma sputtering
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.