Surface characteristics of MOCVD grown TiO2 films by atomic force microscopy

Journal of Materials Science Letters

Volumn 22, Issue 19, 2003, Pages 1325-1328

  Park, Young Bae ^a   Ahn, K H ^b   Park, Dong Wha ^b  

^a HARVARD UNIVERSITY   (United States)

^b Inha University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; FILM GROWTH; GRAIN SIZE AND SHAPE; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MORPHOLOGY; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY; SURFACE STRUCTURE; SURFACE TOPOGRAPHY; THICKNESS MEASUREMENT; X RAY DIFFRACTION ANALYSIS;

DYNAMIC SCALING EXPONENT; FRACTAL GEOMETRY; TOPOGRAPHICAL ANALYSIS;

TITANIUM DIOXIDE;

EID: 0142091621     PISSN: 02618028     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1025775025358     Document Type: Article

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