State of the first aberration-corrected, monochromized 200kV FEG-TEM

Microscopy and Microanalysis

Volumn 9, Issue SUPPL. 3, 2003, Pages 38-39

  Benner, Gerd ^a   Matijevic, Marko ^a   Orchowski, Alexander ^a   Schindler, Bernd ^a   Haider, Max ^b   Hartel, Peter ^b  

^a CARL ZEISS SMT AG   (Germany)

^b CEOS GmbH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0142028718     PISSN: 14319276     EISSN: None     Source Type: Journal    
DOI: 10.1017/s1431927603012005     Document Type: Conference Paper

References (4)

1. M. Haider et al., Nature 392 (1998), 768
2. H. Rose, Optik 34 (1990), 19
3. G. Lang et al., Microsc. Microanal. 8 (Suppl. 2) (2002), 586CD
4. F. Kahl & H. Rose, Proc. EUREM Brno/Cz, Vol.III (2000), 1459