Molecular dynamics simulations of mechanical deformation of amorphous silicon dioxide during chemical-mechanical polishing

Journal of Applied Physics

Volumn 94, Issue 6, 2003, Pages 3853-3861

  Chagarov, Evgueni ^a   Adams, James B ^a  

^a ARIZONA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL MECHANICAL POLISHING; MOLECULAR DYNAMICS; SHEAR STRENGTH; SILICA;

SURFACE TRENCHES;

AMORPHOUS ALLOYS;

EID: 0141990547     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1602551     Document Type: Article

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