An approach to estimate the sputtering yield of water in glow-discharge electrolysis

Journal of Materials Science Letters

Volumn 22, Issue 18, 2003, Pages 1259-1260

  Matsushima, Y ^a   Tezuka, A ^a   Sumida, K ^a   Maeda, K ^a   Noma, T ^a   Yamazaki, T ^a   Suzuki, T ^a  

^a TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; ELECTRIC CONDUCTIVITY OF LIQUIDS; ELECTROCHEMICAL ELECTRODES; EVAPORATION; GLOW DISCHARGES; HYDROGEN; ION BOMBARDMENT; MOLECULES; SPUTTERING; THERMAL EXPANSION; VAPORIZATION; WATER;

GLOW-DISCHARGE ELECTROLYSIS; THERMAL VAPORIZATION;

ELECTROLYSIS;

EID: 0141906223     PISSN: 02618028     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1025454001365     Document Type: Article

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