Diamond synthesis by plasma jet above a liquid surface

Journal of the European Ceramic Society

Volumn 21, Issue 3, 2001, Pages 331-334

  Suzuki, Takeyuki ^a   Wada, Satoshi ^b   Tsukada, Mitsuru ^c   Yamazaki, Tsutomu ^a   Noma, Tatsuo ^a  

^a TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^c HOYA CORPORATION   (Japan)

Author keywords

CVD; Deposition; Diamond; Films; Plasma deposition

Indexed keywords

DEPOSITION; DIAMOND FILMS; FILM GROWTH; LIQUIDS; PLASMA JETS;

LIQUID SURFACES;

SYNTHETIC DIAMONDS;

DIAMOND COATING;

EID: 0035276760     PISSN: 09552219     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0955-2219(00)00184-9     Document Type: Article

References (12)

1. Methods of CVD-diamond production
2. Vapor deposition of diamond particles from methane
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4. Synthesis of diamond thin films by thermal CVD using organic compounds
5. Synthesis of diamond by DC plasma chemical vapor deposition above the surface of a water-ethylene glycol solution
6. DC-plasma-assisted synthesis of diamond and alumina using liquid
7. Process parameters for diamond synthesis by assisted by DC plasma using a water-ethylene glycol solution
8. Raman spectrum and graphite
9. Poly(phenylcarbyne): A polymer precursor to diamond-like carbon
10. Growth of diamond by CVD methods and effects of process parameters
11. Electrochmical processes in glow discharge at the gas-solution interface
12. Towards a general concept of diamond chemical vapour deposition