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Volumn 24, Issue 10, 2003, Pages 628-630
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A Novel Technology to Form Self-Aligned Emitter Ledge for Heterojunction Bipolar Transistors
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Author keywords
Emitter ledge passivation; Heterojunction; Heterojunction bipolar transistor (HBT); Transistor
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Indexed keywords
ETCHING;
PASSIVATION;
PLASMAS;
SEMICONDUCTING ALUMINUM COMPOUNDS;
SEMICONDUCTING GALLIUM ARSENIDE;
SILICA;
SILICON NITRIDE;
EMITTERS;
HETEROJUNCTION BIPOLAR TRANSISTORS;
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EID: 0141883948
PISSN: 07413106
EISSN: None
Source Type: Journal
DOI: 10.1109/LED.2003.817874 Document Type: Article |
Times cited : (8)
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References (6)
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