Modeling soft bake effects in chemically amplified resists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5039 II, Issue , 2003, Pages 1143-1154

  Byers, Jeffrey ^a   Smith, Mark ^a   Mack, Chris ^a   Biafore, John ^b  

^a KLA Tencor Austin   (United States)

^b NONE

Author keywords

Chemically amplified resist; Resist simulation; Soft bake

Indexed keywords

COMPOSITION EFFECTS; COMPUTER SIMULATION; DIFFUSION IN SOLIDS; EVAPORATION; MATHEMATICAL MODELS; PHOTOLITHOGRAPHY; REACTION KINETICS; SOLVENTS;

CHEMICALLY AMPLIFIED RESISTS; FREE VOLUME; NON ISOTROPIC PHYSICAL STATE; QUENCHER CONCENTRATION; SOFT BAKE EFFECTS;

PHOTORESISTS;

EID: 0141834018     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485205     Document Type: Conference Paper

References (14)

1. J.M. Shaw, M.A. Frisch, and F.H. Dill, IBM Journ. Res. Dev., 21, (1977) pp219-226.
2. W.D. Hinsberg, S.A. MacDonald, C.D. Snyder, H. Ito, R.D. Allen, ACS Symposium Series 537, Polymers for Microelectronic: Resists and Dielectrics, American Chemical Society (1993) pp 101-110.
3. A.B. Gardiner, A. Qin, C.L. Henderson, S. Pancholi, W.J. Koros, C.G. Willson, R.R. Dammel, C.A. Mack, and W.D. Hinsberg, Diffusivity Measurements in Polymers Part II: Residual Casting Solvent Measurements by Liquid Scintillation Counting, Proc SPIE vol 3049 (1998) pp 850-860.
4. K.E. Mueller, W.J. Koros, Y.Y. Wang, C.G. Willson, Diffusivity Measurements in Polymers Part III: Quartz Crystal Microbalnce Techniques, Proc SPIE vol. 3049 (1998) pp 871-878.
5. H. Ito, M. Sherwood, NMR Analysis of Chemically Amplified Resist Films, Proc SPIE vol 3049 (1998) pp 850-860.
6. P.J. Paniez, A. Vareille, P. Ballet, B. Mortini, Study of Bake Mechanisms by Real-Time In-Situ Ellipsometry, Proc SPIE vol 3333 (1998) pp 289-300.
7. S. D. Burns; M. D. Stewart; J. N. Hilfiker; R. A. Synowicki; G. M. Schmid; C. Brodsky; C. G. Willson; "Determining Free Volume Changes During the PEB and PAB of a chemically Amplified Resist." Forefront of Lithographic Materials Research, Proc. of the 12th International Conference on photopolymers, McAfee, New Jersey, U.S.A, 323-334 (2000).
8. C. A. Mack, D. P. DeWitt, B. K. Tsai, and G. Yetter, proc. SPIE, 2195, 584 (1994).
9. C.A. Mack, Model Solvent Effects in Optical Lithography, PhD. Dissertation. University of Texas (1998).
10. M.H. Cohen, D. Turnbull, J. Chem. Phys. 31, (1959), p. 1164.
11. Williams, Landel, Ferry, J. American Chem. Soc., 77, (1955), pp 3701-3706.
12. Fujita Transactions of the Faraday Soc., 56, (1960) pp 424-437.
13. J.S. Petersen, J. Byers, and R. Carpio, International Conference on Micro- and Nano-Engineering, University of Glasglow, Scotland, 1996.
14. G.M. Wallraff, J. Opitz, G. Breyta, H. Ito, and B. Fuller, proc. SPIE, 2724, 149 (1996).