Impact of local partial coherence variations on exposure tool performance

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2440, Issue , 1995, Pages 750-770

  Borodovsky, Yan ^a  

^a INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED CIRCUIT MANUFACTURE; OPTICS; PERFORMANCE; SPATIAL VARIABLES CONTROL; TOOLS;

EXPOSURE TOOLS; LINE WIDTH CONTROL; LINEWIDTH VARIATIONS; LOCAL PARTIAL COHERENCE; MONITOR DESIGN; STEPPER EXPOSURE FIELD;

LITHOGRAPHY;

EID: 0029215571     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (1)