Synthesis of a material for semiconductor applications: Boron oxynitride prepared by low frequency rf plasma-assisted metalorganic chemical vapor deposition

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 4, 2003, Pages 1886-1890

  Chen, G C ^a   Lim, D C ^a   Lee, S B ^a   Boo, J H ^a   Kim, Y J ^a   Hong, B Y ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EMISSION SPECTROSCOPY; FILM GROWTH; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SYNTHESIS (CHEMICAL);

FEED GASES;

MATERIALS SCIENCE;

EID: 0141792930     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1585072     Document Type: Conference Paper

References (15)

1. R. B. Kaner, J. Kouvetakis, C. E. Warble, M. L. Sattler, and N. Bartlett, MRS Bull. 22, 399 (1987).
2. M. O. Watenabe, S. Itoh, T. Sasaki, and K. Mizushima, Phys. Rev. Lett. 77, 187 (1996).
3. P. Becker, Adv. Mater. (Weinheim, Ger.) 10, 979 (1998).
4. O. Stephan, P. M. Ajayan, C. Colliex, Ph. Redlich, J. M. Lambert, P. Bernier, and P. Lefin, Science 266, 1683 (1994).
5. H. Hubert, L. A. J. Garvie, P. R. Buseck, W. T. Petuskey, and P. F. McMillan, J. Solid State Chem. 133, 356 (1997).
6. N. Kumar, M. G. Fissel, K. Pourrezaei, B. Lee, and E. C. Douglas, Thin Solid Films 153, 287 (1987).
7. Y. Okamoto, S. Kimura, and H. Ikoma, Jpn. J. Appl. Phys., Part 1 36, 805 (1997).
8. M. Lazarov, P. Raths, H. Metzger, and W. Spirkl, J. Appl. Phys. 77, 2133 (1995).
9. T. Arakawa, R. Matsumoto, and T. Hayashi, Jpn. J. Appl. Phys., Part 1 36, 1351 (1997).
10. Y. Makino, M. Nose, T. Tanaka, M. Misawa, A. Tanimoto, T. Nakai, K. Kato, and K. Nogi, Surf. Coat. Technol. 98, 934 (1998).
11. A. Ishizaka and Y. Shiraki, J. Electrochem. Soc. 133, 666 (1986).
12. G. C. Chen, M. C. Kim, T. H. Kim, S.-B. Lee, and J.-H. Boo, J. Phys. IV 11, 763 (2001).
13. Optical Diagnostics for Thin Film Deposition, edited by I. P. Herman (Academic, New York, 1978), p. 135.
14. Fundamentals of Semiconductor Devices, edited by E. S. Yang (McGraw-Hill, New York, 1978), p. 135.
15. Inorganic Chemistry - Principles of Structure and Reactivity, edited by J. E. Huheey, E. A. Keiter, and R. L. Keiter (Harper Collins College, 1993), p. 274.