Software tool for advanced Monte Carlo simulation of electron scattering in EBL and SEM: CHARIOT

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 I, Issue , 2003, Pages 583-590

  Babin, S ^a   Borisov, S ^b   Cheremukhin, E ^b   Grachev, E ^b   Korol, V ^a   Ocola, L ^c  

^a Soft Services   (United States)

^b MOSCOW STATE UNIVERSITY   (Russian Federation)

^c L E Ocola   (United States)

Author keywords

Absorbed energy; Electron beam lithography; Monte Carlo; Scanning electron microscopy

Indexed keywords

APPROXIMATION THEORY; COMPUTER AIDED SOFTWARE ENGINEERING; COMPUTER SIMULATION; ELECTRON BEAM LITHOGRAPHY; MASKS; MONTE CARLO METHODS; SCANNING ELECTRON MICROSCOPY;

ELECTRON TRANSFER; PLASMONS;

ELECTRON SCATTERING;

EID: 0141724727     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.504568     Document Type: Conference Paper

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