The challenges of image placement and overlay at the 90nm and 65nm nodes

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5038 I, Issue , 2003, Pages 286-292

  Trybula, Walter J ^a  

^a SEMATECH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ELECTRON BEAMS; FITS AND TOLERANCES; LITHOGRAPHY; PHOTORESISTS; SEMICONDUCTOR DEVICE MANUFACTURE;

IMAGE PLACEMENT; OPTICAL MASK; PELLICLE MOUNTING;

MASKS;

EID: 0141723676     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485036     Document Type: Conference Paper

References (5)

1. Mask-related distortions of modified fused silica reticles for 157nm lithography. Andrew Mikkelson, Amr Abdo, Eric Cotte, Jaewoong Sohn, Roxann Engelstad, Edward Lovell. Proceedings of the 2001 BACUS Symposium. SPIE Vol. 4562, pp 914-025, 2001.
2. The International Technology Roadmap for Semiconductors (ITRS) available on WWW via URL http://www.sematech.org or http://public.itrs.net.
3. SEMATECH internal project report from the University of Wisconsin.
4. Strategies for predictive control of chrome stress-induced registration errors. Alexander Wei, G. Hughes, A. Chalekian, L. Mackey, A. Mikkelson, R. Engelstad, To appear in Proceedings of the 2003 SPIE Symposium on Optical Microlithography XVI, 2003.
5. Mechanical Distortions in Advanced optical Reticles. A. Mikkelson, R. Engelstad, E. Lovell, T. Bloomstein, and M. Mason, Proceedings of the 1999 SPIE Symposium on emerging Technologies III. SPIE, Vol. 3676, pp. 744-755, 1999.