Mechanical distortions in advanced optical reticles

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3676, Issue II, 1999, Pages 744-755

  Mikkelson, Andrew R ^a   Engelstad, Roxann L ^a   Lovell, Edward G ^a   Bloomstein, Theodore M ^a   Mason, Mark E ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; FINITE ELEMENT METHOD; MASKS; MATHEMATICAL MODELS; SUBSTRATES;

MASK BLANKS; MECHANICAL DISTORTIONS; OPTICAL RETICLES;

PHOTOLITHOGRAPHY;

EID: 0032686693     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.351143     Document Type: Conference Paper

References (14)