Alicyclic photoresists for CO2-based microlithography at 157 nm

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5039 I, Issue , 2003, Pages 650-654

  Boggiano, Mary Kate ^a   DeSimone, Joseph M ^a,b  

^a University of North Carolina at Chapel Hill   (United States)

^b North Carolina State University   (United States)

Author keywords

Addition polymerization; CO2; Photoresist

Indexed keywords

CARBON DIOXIDE; DIMERS; FLUORINE CONTAINING POLYMERS; MONOMERS; PALLADIUM COMPOUNDS; PHOTOLITHOGRAPHY; POLYMERIZATION; SYNTHESIS (CHEMICAL);

ADDITION POLYMERIZATION; ALICYCLIC PHOTORESISTS; ALLYLPALLADIUM CHLORIDE DIMER; CHEMICAL AMPLIFICATION SWITCHING GROUPS;

PHOTORESISTS;

EID: 0141723292     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485093     Document Type: Conference Paper

References (5)

1. Goldfarb, D. L., de Pablo, J. J., Nealey, P. F., Simons, J. P., Moreau, W. M., Angelopoulos, M., "Aqueous-based photoresist drying using supercritical carbon dioxide to prevent pattern collapse", J. Vac. Sci. Technol. B, 18, 3313-3401, 2000.
2. Sundararajan, N., Yang, S., Ogino, K., Valiyaveettil, S., Wang, J., Zhou, X., Ober, C. K., "Supercritical CO2 processing for submicron imaging of fluoropolymers", Chem. Mater. 12, 41-18, 2000.
3. Hoggan, E. N., Kendall, J. L., Flowers, D., Carbonell, R. G., DeSimone, J. M., "Spin-coating and photolithography using liquid and supercritical carbon dioxide", Polym. Mater. Sci. Eng. 81, 47-48, 1999.
4. Kunz, R. R., Bloomstein, T. M., Hardy, D. E., Goodman, R. B., Downs, D. K., Curtin, J. E., "Outlook for 157 nm resist design", J. Vac. Sci. Technol. B 17, 3267-3272, 1999.
5. Okoroanyanwu, U., Shimokawa, T., Byers, J. D., Willson, C. G., "Pd(II)-catalyzed addition polymerization and ring opening metathesis polymerization of alicyclic monomers: routes to new matrix resins for 193 nm photolithography", J. Molec. Cat. A 133, 93-114, 1998.