Mass analysis of negative ions in etching plasma

Review of Scientific Instruments

Volumn 69, Issue 9, 1998, Pages 3437-3438

  Mizutani, Naoki ^a   Nagata, Yasushi ^a   Kubo, Akira ^a   Hayashi, Toshio ^a  

^a ULVAC INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0141672460     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1149119     Document Type: Article

References (6)

1. H. Shindo, Y. Sawa, and Y. Horiike, Jpn. J. Appl. Phys., Part 2 34, L925 (1995).
2. T. Shibayama, H. Shindo, and Y. Horiike, Plasma Sources Sci. Technol. 5, 254 (1996).
3. T. H. Ahn, K. Nakamura, and H. Sugai, Plasma Sources Sci. Technol. 5, 139 (1996).
4. A. A. Howling, J.-L. Dorier, and Ch. Hollenstein, Appl. Phys. Lett. 62, 1341 (1993).
5. L. J. Overzet, J. H. Beberman, and J. T. Verdeyen, J. Appl. Phys. 66, 1622 (1989).
6. H. Tsuboi, T. Hayashi, and T. Uchida, Jpn. J. Appl. Phys., Part 1 36, 6540 (1997).