Preparing an acrylic ester copolymer as an ultrathick negative photo resist

Materials Letters

Volumn 57, Issue 29, 2003, Pages 4578-4582

  Cheng, Tzong Shing ^a   Lee, Hsin Ying ^a   Lee, Ching Ting ^a   Chen, Hui ^a   Lin, Hsiao Tsung ^a  

^a NATIONAL CENTRAL UNIVERSITY   (Taiwan)

Author keywords

Electronic materials; Near UV photo resist; Negative resist; Photochemical technology; Ultrathick resist

Indexed keywords

ESTERS; LITHOGRAPHY; METHANOL; MONOMERS; PHOTORESISTS; SCANNING ELECTRON MICROSCOPY;

ULTRATHICK RESIST;

COPOLYMERS;

EID: 0141641083     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-577X(03)00364-1     Document Type: Article

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