Metrology and analysis of two dimensional SEM patterns

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4344, Issue 1, 2001, Pages 377-384

  Mack, C A ^a   Jug, S ^a   Jones, R ^a   Apte, P ^a   Williams, S ^a   Pochkowski, M ^a  

^a KLA Tencor Austin   (United States)

Author keywords

Corner rounding; Critical shape difference; ProDATA; SEM image analysis; SIAM

Indexed keywords

EDGE DETECTION; IMAGING TECHNIQUES; MASKS; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS;

CRITICAL DIMENSION (CD);

IMAGE ANALYSIS;

EID: 0034762550     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.436763     Document Type: Article

References (0)