Measurement correlation and tool matching of multiple CDSEMs

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5038 II, Issue , 2003, Pages 990-1001

  Hwu, Justin J ^a   Dulay, Sukhbir ^a   Pham, Thao ^a  

^a SAN JOSE RESEARCH CENTER   (United States)

Author keywords

ANOVA; CDSEM; Tool matching

Indexed keywords

ALGORITHMS; CALIBRATION; EDGE DETECTION; ELECTRON BEAM LITHOGRAPHY; GRAPH THEORY; IMAGE ANALYSIS; INTERFEROMETRY; LASER APPLICATIONS; PHOTORESISTS; SIGNAL TO NOISE RATIO;

ANALYSIS OF VARIANCE; CRITICAL DIMENSION SCANNING ELECTRON MICROSCOPY; ELECTRON BEAM RESIST; FOCUS EXPOSURE PATTERN; LINESCAN AVERAGING; LINESCAN SMOOTHING; MEASUREMENT CORRELATION; SCANNING MAGNIFICATION CORRECTION FACTOR; TOOL MATCHING;

SCANNING ELECTRON MICROSCOPY;

EID: 0141611901     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.483757     Document Type: Conference Paper

References (6)

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6. Current project, to be published.