Investigation of cyclopolymerization for ArF positive photoresist

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5039 II, Issue , 2003, Pages 682-688

  Lee, Youngjoon ^a   Hashimoto, Kazuhiko ^a   Fujishima, Hiroaki ^a   Hanawa, Ryotaro ^a   Uetani, Yasunori ^a  

^a SUMITOMO CHEMICAL CO LTD   (Japan)

Author keywords

Compositional heterogeneity; Cyclopolymerization; Diacrylic monomers; Dry etching resistance

Indexed keywords

ACRYLICS; CHEMISTRY; COMPOSITION; ESTERS; ETCHING; FREE RADICAL POLYMERIZATION; MONOMERS; PHOTOLITHOGRAPHY; PURIFICATION; RESINS;

ARGON FLUORIDE POSITIVE PHOTORESIST; COMPOSITIONAL HETEROGENEITY; CYCLOPOLYMERIZATION; DIACRYLIC MONOMERS; DRY ETCHING RESISTANCE;

PHOTORESISTS;

EID: 0141611659     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485064     Document Type: Conference Paper

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