Fabrication of controlled sidewall angles in thin films using isotropic etches

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 4, 2003, Pages 1240-1247

  Ponoth, Shom S ^a   Agarwal, Navnit T ^a   Persans, Peter D ^a   Plawsky, Joel L ^a  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ETCHING; PHOTORESISTS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICA; SILICON NITRIDE;

ANGULAR SIDEWALLS;

THIN FILMS;

EID: 0141569930     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1574048     Document Type: Conference Paper

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