Morphology and thickness of ultra-thin epitaxial Al2O3 film on Cu-9%Al(111)

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 7 B, 2003, Pages 4721-4724

  Yamauchi, Yasuhiro ^a   Yoshitake, Michiko ^a   Song, Weijie ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

Auger electron spectroscopy; Cu 9 Al(111) single crystal; Epitaxial Al2O3 film; Film thickness; Surface morphology

Indexed keywords

ALUMINA; AUGER ELECTRON SPECTROSCOPY; CHEMICAL BONDS; COPPER ALLOYS; MORPHOLOGY; OXIDATION; OXYGEN; SCANNING ELECTRON MICROSCOPY; SINGLE CRYSTALS; SURFACE ROUGHNESS;

COPPER-ALUMINUM ALLOY; FILM THICKNESS; OXIDE FILM;

ULTRATHIN FILMS;

EID: 0141569259     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.4721     Document Type: Article

References (14)

1. J. Libuda, H.-J. Freund, A. Sandell and M. Bäumer: Surf. Sci. 346 (1996) 108.
2. K. Koski, J. Hölsä and P. Juliet: Thin Solid Films 339 (1999) 240.
3. S. M. Edlou, A. Smajkiewicz and G. A. Al-Jumaily: Appl. Opt. 32 (1993) 5601.
4. R. M. Jaeger, H. Kuhlenbeck, H.-J. Freund, M. Wuttig, W. Hoffman, R. Franchy and H. Ibach: Surf. Sci. 259 (1991) 235.
5. A. Hoffman, T. Maniv and M. Folman: Surf. Sci. 193 (1988) 57.
6. W. Shen, G. L. Nyberg and A. Hoffman, Surf. Sci. 334 (1995) 209.
7. R. J. Baird and T. J. Potter: J. Vac. Sci. Technol. A3 (1985) 1371.
8. R. J. Baird, D. F. Ogletree, M. A. van Hove and G. A. Somorjai: Surf. Sci. 165 (1986) 345.
9. A. Bardi, A. Ateri and G. Rovida: Surf. Sci. 268 (1992) 87.
10. Y. Wu, E. Garfunkel and T. E. Maedy: Surf. Sci. 365 (1996) 337.
11. M. Yoshitake, S. Bera, Y. Yamauchi and W. Song: to be published in J. Vac. Sci. Technol. A.
12. A. Rar and M. Yoshitake: Jpn. J. Appl. Phys. 39 (2000) 4464.
13. C. G. Pantano and T. E. Maedy: Appl. Surf. Sci. 7, (1981) 115.
14. S. Tanuma, C. J. Powell and D. R. Penn: Surf. Interf. Anal. 17 (1991) 927.