Support materials based on converted aluminum films for chemical vapor deposition growth of single-wall carbon nanotubes

Chemical Physics Letters

Volumn 380, Issue 1-2, 2003, Pages 158-164

  Hongo, H ^a   Nihey, F ^a   Ichihashi, T ^a   Ochiai, Y ^a   Yudasaka, M ^a   Iijima, S ^a,b  

^a NEC CORPORATION   (Japan)

^b MEIJO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ALUMINUM OXIDE; CARBON; IRON; SILICON DIOXIDE;

ARTICLE; CATALYST; FILM; PARTICLE SIZE; TEMPERATURE; VAPOR; X RAY DIFFRACTION;

EID: 0141545020     PISSN: 00092614     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cplett.2003.08.103     Document Type: Article

References (12)

1. Hongo H., Yudasaka M., Ichihashi T., Nihey F., Iijima S. Chem. Phys. Lett. 361:2002;349.
2. Kong J., Soh H.T., Cassell A.M., Quate C.F., Dai H. Nature. 395:1998;878.
3. Cassell A.M., Raymarkers J.A., Kong J., Dai H. J. Phys. Chem. B. 103:1999;6484.
4. Harutyunyan A.R., Pradhan B., Kim U., Chen G., Eklund P. Nano Lett. 2:2002;525.
5. Sinfelt J.H. Bimetallic Catalysts. 1983;John Wiley & Sons, New York.
6. Nihey F., Hongo H., Yudasaka M., Iijima S. Jpn. J. Appl. Phys. 41:2002;L1049.
7. Jorio A., Saito R., Hafner J.H., Lieber C.M., Hunter M., McClure T., Dresselhaus G., Dresselhaus M.S. Phys. Rev. Lett. 86:2001;1118.
8. Iler R.K. J. Am. Ceram. Soc. 44:1961;618.
9. Kürti J., Kresse G., Kuzmany H. Phys. Rev. B. 58:1998;R8869.
10. Li Y., Kim W., Zhang Y., Rilandi M., Wang D., Dai H. J. Phys. Chem. B. 105:2001;11424.
11. Cheung C.L., Kurtz A., Park H., Lieber C.M. J. Phys. Chem. B. 106:2002;2429.
12. Delzeit L., Chen B., Cassell A., Stevens R., Nguyen C., Meyyappan M. Chem. Phys. Lett. 348:2001;368.