Electron beam lithography process for advanced optical masks

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 6, 1998, Pages 3158-3163

  Hayashi, Naoya ^a   Kurihara, Masa Aki ^a   Segawa, Toshikazu ^a   Yokoyama, Toshifumi ^a   Abe, Tsukasa ^a  

^a DAI NIPPON PRINTING CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0141544463     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590456     Document Type: Article

References (5)

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4. S. A. Rishton and D. P. Kern, J. Vac. Sci. Technol. B 5, 135 (1987).
5. M. Parikh and D. F. Kyser, J. Appl. Phys. 50, 1104 (1979).