The influence of the baking process for chemically amplified resist on CD performance

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4889, Issue 1, 2002, Pages 599-606

  Sasaki, Shiho ^a   Ohfuji, Takeshi ^b   Kurihara, Masaaki ^a   Inomata, Hiroyuki ^a   Jackson, Curt ^b   Murata, Yoshio ^b   Totsukawa, Daisuke ^a   Tsugama, Naoko ^b   Kitano, Naoki ^b   Hayashi, Naoya ^a   Hwang, David H ^b  

^a DAI NIPPON PRINTING CO LTD   (Japan)

^b INTEL CORPORATION   (United States)

Author keywords

Airflow; Bake; CAR; CD uniformity; Lithography; Mask; PB; PEB; Temperature

Indexed keywords

DENSIFICATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; LITHOGRAPHY; THERMOCOUPLES;

CHEMICALLY AMPLIFIED RESISTS (CAR);

MASKS;

EID: 0141544460     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.468089     Document Type: Conference Paper

References (4)

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3. M. Arai, H. Inomata, T. Nishimura, M. Kurihara, and N. Hayashi: SPIE Proceedings Vol. 2512, pp. 74-87 (1995).
4. S. Sasaki, M. Kurihara, H. Mohri, N.Hayashi, P.Dress, A.Nöring, T. Gairing: EMC2002 pp.107-116