Enhancement of the diamond film characteristics by increasing the cyclic modulation time interval of CH4 flow

New Diamond and Frontier Carbon Technology

Volumn 13, Issue 6, 2003, Pages 333-340

  Kim, Sung Hoon ^a   Kim, Beomjin ^b  

^a Silla University   (South Korea)

^b INDIANA UNIVERSITY PURDUE UNIVERSITY FORT WAYNE   (United States)

Author keywords

Cyclic modulation time interval; Diamond nucleation density; Diamond quality; Low temperature deposition; On off modulation of CH4 flow

Indexed keywords

CARBON INORGANIC COMPOUNDS; GLASS; LOW TEMPERATURE OPERATIONS; MORPHOLOGY; NUCLEATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SUBSTRATES; SURFACES;

CYCLIC MODULATION PROCESS; CYCLIC MODULATION TIME INTERVAL; DIAMOND NUCLEATION DENSITY; VERTICAL-TYPE MICROWAVE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION SYSTEM;

DIAMOND FILMS;

EID: 0141522762     PISSN: 13449931     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (19)

1. A. R. Badzian, D. J. Pickrell, W. Zhu, R. E. Newham and R. Meisser: J. Mater. Res. 6 (1991) 1264.
2. B. S. Park and Y.-J. Baik: Diamond Relat. Mater. 6 (1997) 1716.
3. K. H. Chen, D. M. Bhusari, J. R. Yang, S. T. Lin, T. Y. Wang and L. C. Chen: Thin Solid Films 332 (1998) 34.
4. V. Buck and F. Deuerler: Diamond Relat. Mater. 7 (1998) 1544.
5. S. Schelz, L. Martinu and M. Moisan: Diamond Relat. Mater. 7 (1998) 1291.
6. S. Yugo, T. Kania, T. Kimura and T. Muto: Appl. Phys. Lett. 58 (1991) 1036.
7. S.-H. Kim, Y. S. Park, I. T. Han, J.-W. Lee and W. S. Yun: Appl. Phys. Lett. 69 (1996) 2184.
8. J.-W. Lee, S.-H. Kim, Y. S. Park and I. T. Han: Thin Solid Films 303 (1997) 264.
9. S.-H. Kim, Y. S. Park, W. S. Yun and J.-W. Lee: J. Cryst. Growth 180 (1997) 198.
10. S.-H. Kim, T.-G. Kim, Y.-H. Kim, D. U. Kim, S. K. Lee, T. Hosomi, T. Maki and T. Kobayashi: J. Electrochem. Soc. 148 (2001) C247.
11. W. N. Howard, K. E. Spear and M. Frenklach: Appl. Phys. Lett. 63 (1993) 2641.
12. M. A. Kelly, D. S. Olson, S. Kapoor and S. B. Hagstorm: Appl. Phys. Lett. 60 (1992) 2502.
13. J. Wei and Y. Tzeng: J. Cryst. Growth 128 (1993) 413.
14. Y. S. Park, S. H. Kim, S. K. Jung, M. N. Shinn, J.-W. Lee, S. K. Hong and J. Y. Lee: Mater. Sci. Eng., A 209 (1996) 414.
15. D. S. Olson, M. A. Kelly, S. Kapoor, S. B. Hagstrom: J. Appl. Phys. 74 (1993) 5167.
16. K. V. Ravi and A. Joshi: Appl. Phys. Lett. 58 (1991) 246.
17. P. Reinke, J.E. Klemberg-Sapieha and L. Martinu: J. Appl. Phys. 76 (1994) 5754.
18. S. S. Park and J. Y. Lee: J. Mater. Sci. 28 (1993) 1799.
19. S.-H. Kim, Y. S. Park, S. K. Jung, D. H. Kang and J.-W. Lee: J. Vac. Sci. Technol., A 13 (1995) 1619.