Design and performance of a normal-incidence optical critical dimension metrology system

2001 International Microprocesses and Nanotechnology Conference, MNC 2001

Volumn , Issue , 2001, Pages 238-

  McGahan, W A ^a   Holden, J M ^a   Rovira, P I ^a   Lowe Webb, R ^a   Yarussi, R A ^a   Zhuang, V ^a   Coates, V J ^a  

^a NANOMETRICS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION GRATINGS; LIGHT; NANOTECHNOLOGY; PHOTOLITHOGRAPHY; REFLECTION; SILICON WAFERS;

CRITICAL DIMENSION; LINEARLY POLARIZED; NORMAL INCIDENCE; OPTICAL CRITICAL DIMENSION METROLOGY; PATTERNED SILICON; PHASE DIFFERENCE; POLARIZED PERPENDICULAR; TE-POLARIZED LIGHT;

LIGHT POLARIZATION;

EID: 84960470284     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IMNC.2001.984178     Document Type: Conference Paper

References (0)