Performance of a high NA, Dual stage 193nm TWINSCAN™ step & scan system for 80nm applications

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5040 II, Issue , 2003, Pages 822-840

  De Klerk, Jos ^a   Jorritsma, Louis ^a   Van Setten, Eelco ^a   Droste, Richard ^a   Du Croo De Jongh, Richard ^a   Hansen, Steve ^a   Smith, Dan ^a   Van De Kerkhof, Mark ^a   Van De Mast, Frank ^a   Graeupner, Paul ^b   Rohe, Thomas ^b   Kornitzer, Klaus ^b  

^a ASML   (Netherlands)

^b CARL ZEISS SMT AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; IMAGE PROCESSING; OPTICAL RESOLVING POWER; OPTICS; OPTIMIZATION; PROCESS CONTROL; SEMICONDUCTOR DEVICE MANUFACTURE;

HIGH VOLUME MANUFACTURING; IMAGING CONTROL; OPTICAL LITHOGRAPHY SYSTEM; RESOLUTION ENHANCEMENT TECHIQUES;

LITHOGRAPHY;

EID: 0141498840     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485372     Document Type: Conference Paper

References (9)

1. Michel Klaassen, Dynamic Performance of DUV Step & Scan Systems and Process Latitude, SPIE Vol. 4000, 2000
2. Rian Rubingh, Performance of a High Productivity 300 mm Dual Stage 193 nm 0.75 NA TWINSCAN™ AT:1100B System for 100 nm Applications, SPIE 2002
3. Jo Finders, ArF lithography for sub- 100nm lithography, SEMICON Southwest 2002
4. Peter Dirksen, "Latent image metrology for production of wafersteppers", SPIE Vol. 2440, 1995
5. Mark van de Kerkhof, Integrated wavefront sensor, Poster SPIE2003
6. Born and Wolf, Principles of Optics, Appendix VII
7. V. Wiaux, ArF solutions for low-k1 back-end imaging, SPIE 2003
8. G. de Zwart, Performance of a step-and-scan system for DUV lithography, SPIE Vol. 3051, 1997
9. B. Sluijk, "Performance results of a new generation of 300 mm lithography systems", SPIE Vol. 4346, 1999