Rigorous EUV mask simulator using 2D and 3D waveguide methods

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 I, Issue , 2003, Pages 494-503

  Zhu, Zhengrong ^a   Lucas, K ^b   Cobb, J L ^b   Hector, Scott D ^b   Strojwas, A J ^a  

^a CARNEGIE MELLON UNIVERSITY   (United States)

^b MOTOROLA INC   (United States)

Author keywords

Bossung tilt; Contact holes; EM simulation; EUV mask; Waveguide model

Indexed keywords

BOUNDARY CONDITIONS; COMPUTER WORKSTATIONS; DIFFRACTION; ELECTROMAGNETIC FIELDS; FINITE DIFFERENCE METHOD; LIGHTING; LITHOGRAPHY; MAXWELL EQUATIONS; TIME DOMAIN ANALYSIS; TWO DIMENSIONAL; ULTRAVIOLET RADIATION; WAVEGUIDES;

BOSSUNG TILT; EXTREME ULTRAVIOLET LITHOGRAPHY; PHOTOLITHOGRAPHY SIMULATION;

MASKS;

EID: 0141459707     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.484963     Document Type: Conference Paper

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