Iii-nitride ultraviolet light-emitting diodes with delta doping

Applied Physics Letters

Volumn 83, Issue 3, 2003, Pages 566-568

  Kim, K H ^a   Li, J ^a   Jin, S X ^a   Lin, J Y ^a   Jiang, H X ^a  

^a KANSAS STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

METALLORGANIC CHEMICAL VAPOR DEPOSITION; MICROPROCESSOR CHIPS; SEMICONDUCTING INDIUM COMPOUNDS; SEMICONDUCTOR DOPING; ULTRAVIOLET RADIATION;

DELTA DOPING;

LIGHT EMITTING DIODES;

EID: 0043128525     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1593212     Document Type: Article

References (11)

1. J. R. Lakowicz, Principles of Fluorescence Spectroscopy, 2nd edition (Kluwer Academic, New York, 1999).
2. A. Chitnis, J. Sun, V. Mandavilli, R. Pachipulusu, S. Wu, M. Gaevski, V. Adivarahan, J. P. Zhang, M. Asif Khan, A. Sarua, and M. Kuball, Appl. Phys. Lett. 81, 3491 (2002).
3. V. Adivarahan, A. Chitnis, J. P. Zhang, M. Shatalov, J. W. Yang, G. Simin, M. Asif Khan, R. Gaska, and M. S. Shur, Appl. Phys. Lett. 79, 4240 (2001).
4. A. Yasan, R. McClintock, K. Mayes, S. R. Darvish, P. Kung, and M. Razeghi, Appl. Phys. Lett. 81, 801 (2002).
5. T. Wang, Y. H. Liu, Y. B. Lee, J. P. Ao, J. Bai, and S. Sakai, Appl. Phys. Lett. 81, 2508 (2002).
6. M. L. Nakarmi, K. H. Kim, J. Li, J. Y. Lin, and H. X. Jiang, Appl. Phys. Lett. (submitted).
7. M. Iwaya, T. Takeuchi, S. Yamaguchi, C. Wetzel, H. Amano, and I. Akasaki, Jpn. J. Appl. Phys., Part 2 37, L316 (1998).
8. H. Amano, M. Iwaya, T. Kashima, M. Katsuragawa, I. Akasaki, J. Han, S. Hearne, J. A. Floro, E. Chason, and J. Figiel, Jpn. J. Appl. Phys., Part 2 37, L1540 (1998).
9. S. X. Jin, J. Li, J. Z. Li, J. Y. Lin, and H. X. Jiang, Appl. Phys. Lett. 76, 631 (2000).
10. S. X. Jin, J. Li, J. Y. Lin, and H. X. Jiang, Appl. Phys. Lett. 77, 3236 (2000).
11. H. X. Jiang, S. X. Jin, J. Li, J. Shakya, and J. Y. Lin, Appl. Phys. Lett. 78, 1303 (2001).