Borosilicate glass based x-ray masks for LIGA microfabrication

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4979, Issue , 2003, Pages 514-522

  Desta, Yohannes M ^a   Bednarzik, Martin ^b   Bryant, Michael ^c   Goettert, Jost ^a   Jian, Linke ^b   Jin, Yoonyoung ^a   Kim, Daejong ^c   Lee, Sanghoon ^c   Loechel, Bernd ^b   Scheunemann, Heinz Ulrich ^b   Peng, Zhengchun ^a  

^a LOUISIANA STATE UNIVERSITY   (United States)

^b HAHN MEITNER INSTITUT   (Germany)

^c The University of Texas at Austin   (United States)

Author keywords

Borosilicate; Glass; LIGA; X ray mask

Indexed keywords

BOROSILICATE GLASS; ELECTROPLATING; GOLD PLATING; MASKS; PHOTORESISTS; POLYMETHYL METHACRYLATES; SURFACE ROUGHNESS; TEMPERATURE;

ELEVATED TEMPERATURE; INVAR RING; MICROFABRICATION; NEGATIVE-TONE PHOTORESISTS; POSITIVE-TONE PHOTORESISTS; X-RAY MASKS;

X RAY LITHOGRAPHY;

EID: 0043064162     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.478258     Document Type: Conference Paper

References (9)

1. E. W. Becker, W. Ehrfeld, P. Hagmann, A. Maner, and D. Münchmeyer, "Fabrication of microstructures with high aspect ratios and great structural heights by synchrotron radiation lithography, glavanoforming, and plastic molding (Liga Process)," Microelectronic Eng. 4: 35-56, 1986.
2. H. Guckel, KJ Skrobis, J. Klein, TR Christenson, "Micromechanics via X-ray assisted processing", J. Vacuum Sci Technol A 12(4), pp. 2559-2564, 1994.
3. P. Siddons, E. Johnson, H. Guckel, J. Klein, "Method and apparatus for micromachining using hard X-rays", US patent # 5679502, 1995.
4. K. Fischer, B. Chaudhuri, E. Stiers, H. Guckel, "Large area, cost effective X-ray masks for high energy photons", Microsystems Technologies 6, pp. 117-120, 2000.
5. http://www.camd.lsu.edu.
6. http://www.bessy.de.
7. P. Coane, R. Giasolli, F. De Carlo, D. Mancini, Y. Desta, and J. Göttert, "Graphite-based X-ray masks for deep and ultra-deep X-ray lithography", J. Vac Sci. Technol., B16(6), pp. 3618-3624, Nov/Dec 1998.
8. P.Coane, R. Giasolli, Sam Ledger, Kun Lian, Zhong Geng Ling, and Jost Göttert, "Fabrication of Harm Structures by Deep-X-ray Lithography Using Graphite Mask Technology", Microsystems Technologies 6, pp. 94-98, 2
9. Z. Ling, K. Lian, and Linke Jian, "Improved patterning quality of SU-8 microstructures by optimizing the exposure parameters", SPIE's 25th Annual International Symposium on Microlithography, 27 February-3 March, 2000.