Growth of a sub-micron single diamond particle on a silicon tip and its field emission characteristic

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 6 B, 2003, Pages 4048-4050

  Mimura, Hidenori ^a   Yuan, Guan ^a   Ikeda, Masaru ^a   Yokoo, Kuniyoshi ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Bias assisted treatment; Diamond; Field emission; Microwave plasma enhancement chemical vapor deposition

Indexed keywords

FIELD EMISSION DISPLAYS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; SILICON;

HYDROGEN-METHANE PLASMAS;

DIAMONDS;

EID: 0042863277     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.4048     Document Type: Conference Paper

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