Low temperature nanoscopic kinetics of hydrogen plasma-enhanced crystallization of a-Si:H films

Journal of Applied Physics

Volumn 94, Issue 1, 2003, Pages 443-453

  Khait, Yu L ^a   Weil, R ^a   Beserman, R ^a   Edelman, F ^a   Beyer, W ^b   Rech, B ^b  

^a TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

^b FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLIZATION; LOW TEMPERATURE EFFECTS; METALLIC FILMS; NANOSTRUCTURED MATERIALS; NUCLEATION; PLASMA DENSITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REACTION KINETICS;

MICROCRYSTALLIZATION;

POLYSILICON;

EID: 0042842601     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1574598     Document Type: Article

References (32)

1. K. H. Milliadis, J. Appl. Phys. 63, 2260 (1988).
2. C. Spinella, S. Lombarde, and F. Priolo, J. Appl. Phys. 84, 5383 (1998).
3. R. A. Ditizio, G. Liu, and S. J. Jonsh, Appl. Phys. Lett. 56, 1140 (1990).
4. Plasma Properties, Deposition and Etching, edited by J. J. Pouch and S. A. Alterovitz (Trans Tech Ammerdorf, Switzerland, 1993).
5. K. Pangal, J. C. Sturm, S. Wagner, and R. Büyüklimanly, J. Appl. Phys. 85, 1900 (1999).
6. Yu. L. Khait, in Ref. 4, in Plasma Processing and Synthesis of Materials, edited by Szekely and D. Apelian (American Materials Research Society, Philadelphia, 1984), Vol. 30; Yu. L. Khait, in Plasma Chemistry and Technology (Technomic, Basel, Switzerland, 1985).
7. Yu. L. Khait, in Ref. 4, in Plasma Processing and Synthesis of Materials, edited by Szekely and D. Apelian (American Materials Research Society, Philadelphia, 1984), Vol. 30; Yu. L. Khait, in Plasma Chemistry and Technology (Technomic, Basel, Switzerland, 1985).
8. Yu. L. Khait, A. Inspektor, and R. Avni, Thin Solid Films 72, 249 (1980).
9. Yu. L. Khait and R. Weil, J. Appl. Phys. 78, 6504 (1995).
10. Yu. L. Khait, Kinetics and Applications of Atomic Diffusion in Solids, Nanoscopic Electron-Affected Stochastic Dynamics (SCITEC, Switzerland, 1997).
11. I. Abdulhalim, Yu. L. Khait, R. Beserman, and R. Weil, Appl. Phys. Lett. 55, 1190 (1987); Yu, L. Khait, R. Beserman, A. Chack, R. Weil, and W. Beyer, ibid. 81, 3347 (2002).
12. I. Abdulhalim, Yu. L. Khait, R. Beserman, and R. Weil, Appl. Phys. Lett. 55, 1190 (1987); Yu, L. Khait, R. Beserman, A. Chack, R. Weil, and W. Beyer, ibid. 81, 3347 (2002).
13. Yu. L. Khait and R. Beserman, Phys. Rev. B 33, 2983 (1986).
14. Yu. L. Khait, R. Weil, R. Beserman, W. Beyer, and H. Wagner, Phys. Rev. B 42, 9000 (1990).
15. F. Edelman, C. Cytermann, R. Brener, M. Eizenber, Yu. L. Khait, R. Weil, and W. Beyer, J. Appl. Phys. 75, 7875 (1994).
16. W. Beyer, Semiconductors and Semimetals (1999), Vol. 6, p. 165.
17. J. Perrin, J. Non-Cryst. Solids 137, 639 (1991); C. C. Tsai, in Amorphous Silicon and Related Materials, edited by H. Fritzshe (World Scientific, Singapore, 1988).
18. J. Perrin, J. Non-Cryst. Solids 137, 639 (1991); C. C. Tsai, in Amorphous Silicon and Related Materials, edited by H. Fritzshe (World Scientific, Singapore, 1988).
19. Yu. L. Khait, U. Carmi, A. Inspektor, and R. Avni, Proceedings of the 6th International Symposium on Plasma Chemistry, edited by M. L. Boulos and R. J. Munz, Montreal, 1983; Proceedings of the 7th International Symposium on Plasma Chemistry, edited by C. J. Timmermans, Eindhoven, The Netherlands, 1985.
20. Yu. L. Khait, U. Carmi, A. Inspektor, and R. Avni, Proceedings of the 6th International Symposium on Plasma Chemistry, edited by M. L. Boulos and R. J. Munz, Montreal, 1983; Proceedings of the 7th International Symposium on Plasma Chemistry, edited by C. J. Timmermans, Eindhoven, The Netherlands, 1985.
21. L. P. Shkarovisky, T. W. Johnson, and M. P. Bashinsky, The Particle Kinetics of Plasma (Addison-Wesley, Reading, MA, 1966); E. W. McDaniel, Collision Phenomena in Ionized Gases (Wiley, New York, 1964).
22. L. P. Shkarovisky, T. W. Johnson, and M. P. Bashinsky, The Particle Kinetics of Plasma (Addison-Wesley, Reading, MA, 1966); E. W. McDaniel, Collision Phenomena in Ionized Gases (Wiley, New York, 1964).
23. P. Sigmund, in Sputtering and Ion Bombardment, edited by R. Behrisch (Springer, Berlin, 1981).
24. J. W. Mayer, L. Eriksson, and J. A. Devica, Ion Implantation in Semiconductors (Academic, New York, 1970); G. Carter and J. S. Lolligon, Ion Bombardment of Solids (Heinemann Educational Books, London, 1968).
25. J. W. Mayer, L. Eriksson, and J. A. Devica, Ion Implantation in Semiconductors (Academic, New York, 1970); G. Carter and J. S. Lolligon, Ion Bombardment of Solids (Heinemann Educational Books, London, 1968).
26. In Ref. 18; Photon, Beam and Plasma Stimulated Chemical Processes at Surfaces, edited by V. M. Donnely, I. P. Herman, and M. Herose (Materials Research Society, Pittsburgh, PA, 1987).
27. Yu. L. Khait, Phys. Rep. 99, 237 (1983).
28. Yu. L. Khait, in Recent Progress in Many-Body Theories, edited by A. Kallio, E. Pajanne, and R. F. Bishop (Plenum, New York, 1988).
29. Yu. L. Khait and V. Richter, J. Phys. D 26, 1806 (1993).
30. Yu. L. Khait, R. Beserman, D. Shaw, and K. Dettmer, Phys. Rev. B 50, 14893 (1994); Yu. L. Khait, I. Shapiro, H. Shechter, ibid. 52, 9392 (1995).
31. Yu. L. Khait, R. Beserman, D. Shaw, and K. Dettmer, Phys. Rev. B 50, 14893 (1994); Yu. L. Khait, I. Shapiro, H. Shechter, ibid. 52, 9392 (1995).
32. Yu. L. Khait, A. Silverman, R. Weil, and J. Adler, Phys. Rev. B 44, 8308 (1991).