In situ Raman monitoring of the growth of CVD diamond films

Journal of Raman Spectroscopy

Volumn 34, Issue 7-8, 2003, Pages 505-514

  Mermoux, M ^a   Marcus, B ^a   Abello, L ^b   Rosman, N ^a   Lucazeau, G ^a  

^a CNRS   (France)

^b NONE   (France)

Author keywords

Diamond films; In situ Raman monitoring; Plasma chemical vapour deposition

Indexed keywords

FILM GROWTH; SIGNAL TO NOISE RATIO;

BACKGROUND RADIATION; CHEMICAL VAPOR DEPOSITION REACTORS; CVD DIAMOND FILMS; DIAMONDS FILMS; IN SITU RAMAN MONITORING; MULTICHANNEL DETECTION SYSTEMS; PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION; PLASMA CHEMICAL VAPOR DEPOSITION; RAMAN MONITORING; SITU RAMAN;

DIAMOND FILMS;

DIAMOND;

ARTICLE; CHEMICAL PROCEDURES; CHEMICAL VAPOR DEPOSITION; FILM; GATED IMAGING; MULTICHANNEL RECORDER; PHASE TRANSITION; PLASMA; PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION REACTOR; PROCESS DEVELOPMENT; RADIATION MEASUREMENT; RAMAN SPECTROMETRY; REACTOR; SIGNAL NOISE RATIO; STRESS;

EID: 0042838262     PISSN: 03770486     EISSN: None     Source Type: Journal    
DOI: 10.1002/jrs.1012     Document Type: Article

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