Bifocal plasma source for treatment of gaseous pollutants

Surface and Coatings Technology

Volumn 174-175, Issue , 2003, Pages 498-502

  Kaiser, M ^a   Emmerich, R ^a   Urban, H ^a   Joos, M ^a   Elsner, P ^a  

^a FRAUNHOFER INSTITUTE FOR CHEMICAL TECHNOLOGY ICT   (Germany)

Author keywords

Atmospheric plasma; Halogen; PACVD; Pollutant; Volatile organic compunds (VOC); Waste gas

Indexed keywords

ATMOSPHERIC PRESSURE; HAZARDOUS MATERIALS; MICROWAVES; POLLUTION CONTROL;

GASEOUS POLLUTANTS;

PLASMA SOURCES;

COATING; INDUSTRIAL APPLICATION; PLASMA; SURFACE PROPERTY;

EID: 0042829257     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00622-4     Document Type: Article

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