A low cost high resolution pattern generator for electron-beam lithography

Review of Scientific Instruments

Volumn 74, Issue 7, 2003, Pages 3579-3582

  Pennelli, G ^a   D'Angelo, F ^a   Piotto, M ^b   Barillaro, G ^a   Pellegrini, B ^a,b  

^a UNIVERSITY OF PISA   (Italy)

^b CNR   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER AIDED DESIGN; COMPUTER SOFTWARE; DIGITAL TO ANALOG CONVERSION; FIELD PROGRAMMABLE GATE ARRAYS; NOISE ABATEMENT; PERSONAL COMPUTERS; PHOTOLITHOGRAPHY; SCANNING ELECTRON MICROSCOPY;

PATTERN GENERATION;

ELECTRON BEAM LITHOGRAPHY;

EID: 0042768108     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1583861     Document Type: Article

References (6)

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2. J. G. Goodberlet, I.T. Hasting, and H. I. Smith, J. Vac. Sci. Technol. B 19, 2499 (2001).
3. J. C. Nabity and M. N. Wyboume, Rev. Sci. Instrum. 60, 27 (1989.
4. See web site of RAITH, Germany.
5. S. Straehle, K. D. Schock, F. E. Prins, and D. P. Kern, Microelectron. Eng. 35, 465 (1997).
6. E. H. Anderson, V. Boegli, and L. P. Muray, J. Vac. Sci. Technol. B 13, 2529 (1995).