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New Diamond and Frontier Carbon Technology

Volumn 13, Issue 4, 2003, Pages 231-243

Fabrication of carbonaceous thin films and clusters using the low temperature rf plasma generated under atmospheric pressure

(4) Terajima, Takeshi a Chaudhary, K A b Inomata, Kiyoto c Koinuma, Hideomi a

a TOKYO INSTITUTE OF TECHNOLOGY (Japan)

b THE ISLAMIA UNIVERSITY OF BAHAWALPUR (Pakistan)

c TOKYO GAS CO LTD (Japan)

Author keywords

Atmospheric pressure; Fullerene; Glassy carbon; Low temperature plasma; Non equilibrium glow discharge

Indexed keywords

ANODES; ATMOSPHERIC TEMPERATURE; CHEMICAL VAPOR DEPOSITION; FILM PREPARATION; FULLERENES; GLASS; GLOW DISCHARGES; LOW TEMPERATURE EFFECTS; PLASMAS; SURFACE TREATMENT;

CARBONACEOUS THIN FILMS; NON-EQUILIBRIUM GLOW DISCHARGES; PLASMA GAS FLOWS;

THIN FILMS;

EID: 0042745450 PISSN: 13449931 EISSN: None Source Type: Journal
DOI: None Document Type: Article

Times cited : (2)

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