The measurement of annealing cycle effect of Si-Ge-Au amorphous thin film with anomalously large thermoelectric power by using photoacoustic spectroscopy

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 5 B, 2003, Pages 3048-3051

  Okamoto, Yoichi ^a   Miyata, Akiko ^a   Sato, Yoshikazu ^a   Takiguchi, Hiroaki ^a   Kawahara, Toshio ^a   Morimoto, Jun ^a  

^a NATIONAL DEFENSE ACADEMY   (Japan)

Author keywords

Amorphous; PAS; Photoacoustic; SiGe; Thermoelectrics; Thin film

Indexed keywords

AMORPHOUS FILMS; ANNEALING; CRYSTAL LATTICES; DEPOSITION; DIFFUSION; PHOTOACOUSTIC SPECTROSCOPY; SUPERLATTICES; THERMOELECTRICITY; VACUUM APPLICATIONS; X RAY DIFFRACTION ANALYSIS;

AMORPHOUS THIN FILM; ANNEALING CYCLE EFFECT; SUPERLATTICE STRUCTURE;

SILICON ALLOYS;

EID: 0042744844     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.3048     Document Type: Article

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