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Volumn 161-163, Issue , 2000, Pages 359-365
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A novel micro-structured reference material for microbeam analysis
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Author keywords
Beam spot size; Certified distances; Certified reference material; Micro lithography; Microbeam profile; Permalloy; Scanning system parameters
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Indexed keywords
CRYSTAL MICROSTRUCTURE;
ION MICROSCOPES;
LITHOGRAPHY;
MICROELECTRONIC PROCESSING;
NICKEL ALLOYS;
RUTHERFORD BACKSCATTERING SPECTROSCOPY;
SILICON;
SILICON WAFERS;
SUBSTRATES;
X RAYS;
BEAM SPOT SIZE;
CERTIFIED DISTANCES;
CERTIFIED REFERENCE MATERIAL;
MICROBEAM ANALYSIS;
MICROBEAM PROFILE;
MICROBEAMS;
MICROLITHOGRAPHY;
PERMALLOY;
SCANNING SYSTEM PARAMETERS;
PARTICLE BEAMS;
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EID: 0042721498
PISSN: 0168583X
EISSN: None
Source Type: Journal
DOI: 10.1016/S0168-583X(99)00955-6 Document Type: Article |
Times cited : (7)
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References (5)
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