A novel micro-structured reference material for ion and X-ray microbeam analysis

Mikrochimica Acta

Volumn 132, Issue 2-4, 2000, Pages 521-525

  Wätjen, Uwe ^a   Bársony, István ^b   Dücsö, Csaba ^b  

^a JOINT RESEARCH CENTRE   (Italy)

^b RESEARCH INSTITUTE FOR TECHNICAL PHYSICS AND MATERIALS SCIENCE   (Hungary)

Author keywords

Beam spot size; Micro lithography; Microbeam analysis; Permalloy on silicon; Reference material

Indexed keywords

EID: 0000214734     PISSN: 00263672     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (6)

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4. U. Wätjen, I. Bársony, G. W Grime, I. Rajta, Nucl. Instr. Meth. Phys. Res. 1999, B150, 532.
5. G. J. F. Legge, J. S. Laird, L. M. Mason, A. Saint, M. Cholewa, D. N. Jamieson, Nucl. Instr. Meth. Phys. Res. 1993, B77, 153.
6. "Development of reference materials for high-energy ion microprobe work", Internal Report, ATKI Research Institute for Materials Science. Budapest, Hungary, 1997.