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Volumn 652, Issue , 2003, Pages 103-111

Novel methods of synthesis of a-Si(H)/Mo multilayers for Extreme UV applications

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON TEMPERATURE; HYDROGEN; LANGMUIR PROBES; OPTICAL MULTILAYERS; PLASMA DENSITY; SILICON; SILICON ALLOYS; X RAYS;

EID: 0042704013     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.1536366     Document Type: Conference Paper
Times cited : (5)

References (15)
  • 1
    • 0035767161 scopus 로고    scopus 로고
    • Damage resistant and low stress Si-based multilayer mirrors
    • edited by A. Tichenor et al., SPIE Proceedings
    • Feigl, T., Yulin, S., Kuhlmann, T. and Kaiser, N., "Damage resistant and low stress Si-based multilayer mirrors" in Soft X-Ray and EUV imaging Systems II, edited by A. Tichenor et al., SPIE Proceedings 4506, 2001, pp. 121-127.
    • (2001) Soft X-Ray and EUV Imaging Systems II , vol.4506 , pp. 121-127
    • Feigl, T.1    Yulin, S.2    Kuhlmann, T.3    Kaiser, N.4
  • 2
    • 0035766813 scopus 로고    scopus 로고
    • Improved reflectance and stability of Mo/Si multilayers
    • edited by A. Tichenor et al., SPIE Proceedings
    • Bajt, S., Alameda, J., Barbee Jr., T., Clift, et al, "Improved reflectance and stability of Mo/Si multilayers" in Soft X-Ray and EUV imaging Systems II, edited by A. Tichenor et al., SPIE Proceedings 4506, 2001, pp. 65-75.
    • (2001) Soft X-Ray and EUV Imaging Systems II , vol.4506 , pp. 65-75
    • Bajt, S.1    Alameda, J.2    Barbee, T.3    Clift4
  • 3
    • 0035764905 scopus 로고    scopus 로고
    • Enhanced soft X-ray reflectivity of Cr/Sc multilayers by ion assisted sputter deposition
    • edited by A. Tichenor et al, SPIE Proceedings
    • Eriksson, F., Johansson, G. A., Hertz, H. M., and Birch., J., "Enhanced Soft X-Ray Reflectivity of Cr/Sc Multilayers by Ion Assisted Sputter Deposition" in Soft X-Ray and EUV imaging Systems II, edited by A. Tichenor et al, SPIE Proceedings 4506, 2001, pp. 84-92.
    • (2001) Soft X-Ray and EUV Imaging Systems II , vol.4506 , pp. 84-92
    • Eriksson, F.1    Johansson, G.A.2    Hertz, H.M.3    Birch, J.4
  • 4
    • 17744400483 scopus 로고    scopus 로고
    • Mo/Si multilayer coating technology for EUVL, coating uniformity and time stability
    • edited by N. Kaiser et al., SPIE Proceedings
    • Louis, E., Yakshin, A.E., Görts, P.C., et al., "Mo/Si multilayer coating technology for EUVL, coating uniformity and time stability" in Soft X-Ray and EUV imaging Systems, edited by N. Kaiser et al., SPIE Proceedings 4146, 2000, pp. 60-63.
    • (2000) Soft X-Ray and EUV Imaging Systems , vol.4146 , pp. 60-63
    • Louis, E.1    Yakshin, A.E.2    Görts, P.C.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.