Correlation of stress behavior with hydrogen-related impurities in plasma-enhanced chemical vapor deposited silicon dioxide films

Journal of Applied Physics

Volumn 82, Issue 6, 1997, Pages 2922-2932

  Haque, M S ^a   Naseem, H A ^a   Brown, W D ^a  

^a University of Arkansas   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0042677092     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.366126     Document Type: Article

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