Aging of photochemical vapor deposited silicon oxide thin films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 2, 1996, Pages 436-440

  Parada, E G ^a   Gonzalez P ^a   Pou, J ^a   Serra, J ^a   Fernandez D ^a   Leon B ^a   Perez Amor M ^a  

^a UNIVERSITY OF VIGO   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

AGING OF MATERIALS; CHEMICAL VAPOR DEPOSITION; ELLIPSOMETRY; EXCIMER LASERS; INFRARED SPECTROSCOPY; LOW TEMPERATURE OPERATIONS; MOISTURE; RELAXATION PROCESSES; SILICA; STRUCTURE (COMPOSITION);

FILM AGING; PHOTOCHEMICAL VAPOR DEPOSITION; SILICON OXIDE FILMS;

THIN FILMS;

EID: 0030107240     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580102     Document Type: Article

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